全部 广东/JHD 罗恩 alfa Sigma-Aldrich

全部 2mg 5mg 10mg 20mg 25mg 30mg 50mg 100mg 200mg 250mg 0.25g 500mg 0.5g 1g 1000mg 2g 2.5g 5g 10g 20g 25g 50g 75g 80g 100g 125g 200g 250g 280g 300g 400g 500g 625g 750g 800g 4*500g 5*1kg 3*1kg (c)0.5g (c)100g (c)10g (c)25g 6*1kg 4*100g 6*100g 6*500g 2*1kg 10*1g 4*1kg 4*2.5kg 5*500g 12*500g 1kg 1000g 1.5kg 1.9kg 2kg 2000g 2.5kg 2500g 3kg 4kg 5000g 5kg 8kg 9kg 10000g 10kg 12kg 15kg 16kg 18kg 20kg 25kg 30kg 35kg 50kg 185kg 210kg 330kg AR5000ml AR500ml 190uL 1mL 1.2mL 2mL 2.5mL 3.2mL 04 5mL 10mL 20mL 25mL 40mL 50mL 80mL 100mL 200mL 250mL 400mL 500mL 800mL 940mL 1LT 2.5LT 100GR 500GR 25GR 5GR 250GR 1ea 4*1L 5LT 50GR 10GR 10LT 1GR 3*1.2mL 4*2mL 4*4L 8in 10*8in sampLe-k 1kg-k 100tab 50tab 25LT 1EA 2ea sampLe 100g-k 4*500mL 20kg-k 10kg-k 25kg-k 1kg-f 9kg-k 2.5GR 5kg-k 4*100mL 4*25mL 500g-f 7in 4kg-k 500g-k 10*10mL 10*1mL 10*2mL 100g-a 500g-a 5g-a 25g-k 100mL-F 100mL-f 500mL-f 12*100mL 6*500mL 6*1L 4*2.5L 10g-f 50g-f 2EA 1L-F 250mL-F 1L-f 250mL-f 50mL-f 5ea 1g-f 1g-r 80g-k 8kg-k 1mL-F 1mL-f 2*10mL 2.5L-f 25kg-H 2kg-k 250g-f 4*2L 250mg-r 25g-f 25kg-a 25g-a 5kg-a 1kg-a 2LT SAMPLE-K 3*1.5mL 3*1L 450g-eu 100g-f 50g-F 50mL-F 5mL-F 5ga 5mL-a 5mL-r 6*100mL 6*2.5L 6*450mL 6*800mL 750GR 80GR 100kg-k 2.5kg-k 400g-k 1.9kg-k 12kg-k 15kg-k 1L 1000mL 1.8L 2L 2500mL 2.5L 4L 5L 5000mL 10000mL 10L 17L 18L 20L 25L 45L 200L 1400L

全部 99%,forproteinsequencing fLake,10mm,purity99.5%,weight10?g powder, extent of LabeLing: 5 wt. % Loading powder,250max.part.size(micron),purity99.95%,weight100?g ≥99%,forproteinsequencing 1000ug/ml 99% 98% 98.00% 97% 98+% 99.00% 99+% 95% anaLyticaLstandard 96% 97.00% ≥99% 99.9% AR,99% AR 99.999% 99.5% 95.00% PharmaceuticaLSecondaryStandard;CertifiedReferenceMateriaL 99.99% AR,98% 99.7+% 99.5+% ≥99.5%(GC)（标准试剂） 99.500% 99.5%（GC）（标准试剂） 97+% 99.8+% ≥98% 96.00% AR,99.5% ReagentPLus?,99% 90% 99.8% 99% min 99.9%（高纯试剂） PESTANAL?,anaLyticaLstandard CP,98% ReagentPLus?,≥99% 99.5%（标准试剂） ≥98%,FG 98.0-102.0% 98.5+% 99.0% min 99.99%（高纯试剂） 99.995% 99.998% reagentgrade,98% 94% 90.0% 98% min CP anhydrous,≥99% ≥97%,FG ≥99%,FG 90+% 99.95% ≥98%,FCC,FG 99.6% 99.98% 99.99%tracemetaLsbasis GR,99% technicaLgrade 80% 85% 99.7% 99.999%tracemetaLsbasis technicaLgrade,90% ≥99.5% 99%(GC) 99.5% min 99.5%(标准试剂) ACSreagent,≥99.0% AR,98.5% 70% aq. 95+% 99.9+% 99.900% 99.996% AR,97% ≥97% ≥99.99%tracemetaLsbasis 99.99%（高纯试剂) 99.999% (高纯试剂） Standard for GC,≥99.5%(GC) Standard for GC certifiedreferencemateriaL,TraceCERT? naturaL,≥98%,FCC,FG purum,≥98.0%(GC) ≥95% ≥99%,FCC,FG ≥99.0% 1.0 M soLution of THF 1.0?MinmethyLenechLoride 96+% 99.99% trace metaLs basis GR,99.5% Standard for GC,>99.5%(GC) naturaL,≥95%,FG naturaL,≥99%,FCC,FG purifiedbyredistiLLation,≥99.5% ≥95.0%(GC) ≥97.0%(GC) ≥99.0%(GC) ≥99.8%(GC)（标准试剂） 25% aq. 35% w/w aq. 50% w/w aq. 70% 97.0% min 98.0% min 98.5% 99.3% 99.5%(GC) 99.9%(高纯试剂) 99.9900% 99.999% trace metaLs basis 99.9995% >99.0%(GC) ACSreagent,≥99.5% AR,99.0% CP,97% GR PESTANAL ,anaLyticaLstandard anhydrous,99.5% anhydrous,ZerO2?,99.8% reagentgrade,≥98% ≥99.5% (GC) ≥99.7%(GC)（标准试剂） 分析标准试剂 1.0 M in THF 25% w/w in methanoL 37% in aq. 5.4M (30 wt.%) soLution in methanoL 60+% n-hexane 75.00% 85.00% 85.8% 97.0-102.0% 98.500% 99%（GC）（标准试剂） 99.4+% 99.5%（分析标准试剂） 99.7+% min 99.700% 99.9% min 99.95%（高纯试剂） 99.99%(高纯试剂) 99.9985% 99.9999% ACSreagent,≥99% ACSreagent,≥99.8% ACS AR,90% Standard for GC,≥99.7%(GC) anhydrous,99% anhydrous,99.8% anhydrous,powder,99.99%tracemetaLsbasis anhydrous,powder,99.999%tracemetaLsbasis naturaL,≥98%,FG puriss.p.a.,≥99.5%(GC) purum,≥97.0%(GC) reagentgrade,97% reagentgrade ≥95%,FG ≥99%(GC)（标准试剂） 分析对照品,99% 分析对照品试剂 1.0?MinTHF 10% v/v aq. 25% w/v aq. 28.0-30.0% NH{3} 35% w/w aq. soLn. 40% w/w aq. 40?wt.%inH2O 47.0-49.0% 48% min w/w aq. 50% aq. 50% v/v aq. 55% w/w aq. 60-64% 70% azeotrope with methanoL 70-75% 8-10% avaiLabLe chLorine 80.0% 81-91% 85 wt% aq. 85% min 85% w/w aq. 85.4% 88+% 8N in water 91.6% 94-98% 96% min 96.0% min 97% min 97.7% min 98%(GC) 98.8% 99% min. 99+% min. 99.0+% 99.0-100.5% 99.0-103.0% 99.2% 99.3+% 99.6% min 99.7%（GC）（标准试剂） 99.9%tracemetaLsbasis 99.9%（GC）（标准试剂） 99.998%tracemetaLsbasis 99.999%（高纯试剂） >90% >98.0%(GC) >99%(GC) >99.5%(GC) ACS, ≥99.0% ACSreagent,≥98.0% GR,99.8% HPLCPLus,forHPLC,GC,andresidueanaLysis,99.9% LiOH 56.5% min PT ReagentPLus?,≥99.0% SP Standard for GC, ≥99.5% (GC) Standard for GC,>99%(GC) StandardforGC,>99.0% ca 50% w/w aq. soLn. ca 60% w/w aq. soLn. certifiedreferencemateriaL,TraceCERT hydrogen-storagegrade naturaL,98%,FG naturaL,FG naturaL,≥97%,FCC,FG powder producedbyWackerChemieAG,Burghausen,Germany,≥99.0%(GC) suitabLeforHPLC,≥99.5% suitabLeforHPLC,≥99.9% technicaLgrade,80% ≥90% ≥96% ≥97%,FCC,FG ≥98.0% (GC) ≥99.0% (GC) ≥99.9%tracemetaLsbasis ≥99.99% trace metaLs basis 工业级 环保级 0.05% w/v soLution in ethanoL 0.1% w/v soLution in ethanoL 0.5% w/v in aLcohoL 1.0 M in hexanes 1.0?Minhexanes 1.0M aq. SoL 1?MindichLoromethane 2.0 M soLution of THF 20 wt.% aq. 20-22% NH{3} 23% w/w aq. 25 wt% aq. 25 wt% in methanoL 25% in water 25?wt.%inH2O 30% in H{2}O 30% w/v aq. 30% w/w aq. 31% in methanoL 33 wt% soLution in gLaciaL acetic acid 33% w/w (45% w/v) soLn. in acetic acid 33wt.% in water 34% w/w aq. 35?wt.%inH2O 37% w/w aq. 40% w/v aq. 40% w/w aq. soLn. 40% w/w in methanoL 40-44% w/w aq. 45% w/v aq. 47% 48% BF3 50 wt% aq. 50?wt.%inH2O 56% 57 wt. %, distiLLed, 99.999% trace metaLs basis 57% w/w aq. soLn 60% 70% in methanoL 70?wt.%inH2O 75%, remainder water 75% 79.5-81.0% 80% in mineraL spirits 80% in toLuene 85% aq. 85+% in water 98.5% min 98.9% 99%,FG 99%,含铜屑稳定剂 99%（GC） 99%（标准试剂） 99.0% (GC) 99.0-102.0% 99.1% 99.3-100.3% 99.4% 99.4-100.4% 99.5% (GC) 99.5%（重蒸试剂） 99.7%（分析标准试剂） 99.8% min 99.8%-100.3% 99.8-100.3% 99.85% 99.9% metaLs basis 99.9%(GC) 99.9%(生物技术试剂) 99.9%（分析标准试剂） 99.9%（标准试剂） 99.95%tracemetaLsbasis 99.95-100.05 99.99% (高纯试剂） 99.99% metaLs basis 99.99% min 99.995% trace metaLs basis 99.995%tracemetaLsbasis 99.995%（高纯试剂） 99.997% 99.99999% ACS,≥99.0% ACSreagent,≥85?wt.%inH2O ACSreagent AR,40% AR,99.7% AR,99.8% AR,≥99% BioULtra,formoLecularbioLogy,≥99.5%(GC) BioXtra,≥99% CP,98.0% FG In 29% min ReagentPLus , 99% Standard for GC,>99.0% Standard for GC,>99.8%(GC) Standard for GC,≥99.8%(GC) Standard for GC,≥99.9%(GC) anhydrous,97% anhydrous,free-fLowing,Redi-Dri?,ACSreagent,≥99% biotech.grade,≥99.9% ca 84% ca. 48 wt% in water ca. 48% in water dendriticpieces,purifiedbydistiLLation,99.99%tracemetaLsbasis eLectronicgrade,99.999%tracemetaLsbasis formoLecularbioLogy,≥99% meetsUSPtestingspecifications naturaL,99%,FG packagedforuseindepositionsystems peroxidasesubstrate powder,99% puriss.,≥98.5%(GC) puriss.p.a.,ACSreagent,≥99.0%(GC) puriss.p.a.,≥99.0%(GC) purum,≥99.0%(GC) reagent grade, 98% spectrophotometricgrade,99% subLimed,≥99% suitabLeforHPLC,99.5% suitabLeforHPLC,99.9% suitabLeforHPLC,≥99.8% ≥99.8% suitabLeforeLectrophoresis,≥99% tabLet,20mgsubstratepertabLet tabLet,5mgsubstratepertabLet technicaL grade, 90% technicaLgrade,92% ≥95%,FCC,FG ≥95.0% (GC) ≥97.0% ≥98.0%(GC) ≥98.0%(T) ≥98.5%(GC) ≥99%(GC) ≥99%,FCC ≥99.5%(GC) ≥99.5%,FCC,FG ≥99.5%,purifiedbyredistiLLation 分析标准品,≥99.8%(GC) 分析标准品,用于环境分析 分析标准品 色谱级 重蒸馏,99.5% (singLecrystaLsubstrate),,diam.×thickness2?in.×0.5?mm ,Standard for GC, ≥99.5% (GC -325MeshparticLesize,99.99%tracemetaLsbasis,eLectronicgrade - 0.01M,PH=7.0 0.05 M 0.1?MCH3SO3Hinwater(0.1N),eLuentconcentrateforIC 0.1?MF-,anaLyticaLstandard(forion-seLectiveeLectrodes) 0.1?MNO2-,forion-seLectiveeLectrodes 0.1?mg/mlinDMSO 0.1M，PH=6.8 0.1moL/L 0.2?Min2-methyLtetrahydrofuran 0.2?MintoLuene 0.3000 moL/L (0.3N) 0.3?N 0.4M in water 0.5 M in THF 0.500% 0.5?Min2-methoxyethyLether 0.5?MinTHF 0.5M,PH=7.0 0.5M,PH=7.2-7.4 0.6?MingLaciaLaceticacid,containsthioureaasstabiLizer 0.8-2mm(元素分析专用) 0.9M (14 wt.%) soLution in cycLohexane 1 M in acetonitriLe 1 M soLution of DCM 1% w/v in aLcohoL 1%+50%乙醇水 1.0 M in dibutyL ether 1.0 M in heptane 1.0 M in methyLene chLoride 1.0 M soLution in Hexanes, 1.0 M soLution in ToLuene, 1.0 M soLution of heptane 1.0 M soLution of hexanes 1.0 M soLution of toLuene 1.0 Minheptane 1.0?MinDMF 1.0?MinethanoL 1.0?MinmethanoL 1.0?Minnitrobenzene 1.0?MintoLuene 1.0?N,BioReagent,suitabLeforceLLculture 1.0M aq. soLn. 1.0M 二氯甲烷溶液 1.0M 甲苯溶液 1.3 M soLution in hexane 1.4?MinTHF:toLuene(1:3) 1.4?MintoLuene 1.6 M soLution of Hexanes 1.9?Min2-methyLtetrahydrofuran 1/500 10% in propanedioL 10% soLution in xyLene 1000?μg/mlinacetone,anaLyticaLstandard 100μg/ml，U%=2(溶剂：石油醚) 100μg/ml，U(%)=2，介质：甲苯 10?wt.%,matrixsiLicageLsupport 10?wt.%inH2O 13-14%(活性氧) 15 wt. % in toLuene 16% w/v aq. 190?proof,ACSspectrophotometricgrade,95.0% 1?MinTHF 1?Minaceticacid 1M in THF 1M,PH=8 2.0 M in THF 2.0 M in pentane 2.0 M in tert-butyL methyL ether, anhydrous 2.0 MinchLorobenzene 2.0?MincycLohexane 2.0?MinmethyLenechLoride 2.0 M in tert-butyL methyL ether, contains copper as stabiLizer 2.3 M in 2-methyLtetrahydrofuran 2.5 M soLution of Hexanes 2.5 M soLution of THF 2.500% 2.8 M soLution of 2-methyL-THF 2.9?Min2-methyLtetrahydrofuran 20 wt. % in H2O 20% in water 20% w/w（溶剂：乙醇） 20%soLutioninxyLene 20-25?wt.%inH2O 200?proof,anhydrous,≥99.5% 22mm (0.9in) 直径, 99% (metaLs basis), Sr ≤0.8% 25 wt.%intoLuene 25 wt.% 25%(溶剂：水，电镜专用试剂) 25?wt.%inmethanoL 25?wt.%inpropyLenegLycoL 25?wt.%intoLuene 28% NH3 in H2O（电子级试剂） 28%NH3inH2O,≥99.99%tracemetaLsbasis 2M in THF 3%(溶剂：水） 3.0 M soLution of 2-MethyL-THF 3.0 M soLution of DiethyL ether 3.0 M soLution of diethyL ether 30?nm(SEM) 30?wt%dispersioninmineraLoiL 30?wt.%inH2O 31-35?wt.%inethanoL,4.2?M,containstoLueneasstabiLizer 33 wt.% （溶剂：HOAc） 33-35% TiO2 35?wt.%indiLutenitricacid,≥99%tracemetaLsbasis 40 wt. % in H2O 40 wt.% aq. 40% Pt 40% w/w（溶剂：H2O） 40%,suitabLeforeLectrophoresis,steriLe-fiLtered 40?wt.%inH2O,99.95%tracemetaLsbasis 40?wt.%inisopropanoL 44-46% Se 44-47%（SiO2计量） 45 wt.%inH₂O,FG 48% w/w aq. 48%（BF3计量） 48?wt.%inH2O,≥99.99% 49wt. %(电子级，溶剂：水)99.99998%metaLs basis 4?M(with0.2%(w/v)tryptamine) 5% in heptane 5% w/v in methanoL 5.0-6.0 M in nonane 5.0-6.0?Mindecane 50 μg/mlinacetone,anaLyticaLstandard 50% Mixture of Isomers 50% in H2O 50% in pentane 50% w/v aq. 50%(溶剂：水，照相级试剂) 50%(溶剂：水，电镜专用试剂) 50%(溶剂：水，高纯度医用级) 50%inH2O,suitabLeforphotographicappLications 50%inH2O 50%水溶液 50%（溶剂：超纯水，电子级试剂） 50.0% 50?wt.%inH2O,FCC 52.00% 53.5-56.5%inH2O 55% Mixture of Isomers 55-58% 55.0 - 58.0 % 55.00% 57?wt.%inH2O,distiLLed,stabiLized,99.95% 5?MinTHF 6% w/v 6.1 N 60 % dispersion in mineraL oiL 60%(溶剂：水) 60%meta,40%paraand1%ortho,99%,contains~50?ppm4-tert-butyLcatechoLasinhibitor 60.0% 65.00% 68-72% in H2O 7.0 M soLution of MeOH 7.8 - 8.2%（Co 计量，溶剂:40%-80%石脑油） 70%(溶剂：水) 70%,remainderwater 70%inH2O 70%（溶剂：H2O） 70.0% 75% (contains ca. 23% isomer) 75%，消毒专用 77 wt. % in H2O 80 wt.% soLution in toLuene 80% Mixture of Isomers 80%,technicaLgrade 80-85 % 80?wt.%intoLuene,contains0.3%magnesiumoxideasstabiLizer 80?wt.%inxyLene 85 wt. % in H2O, 99.99% trace metaLs basis 85?wt.%inH2O,FCC,FG 8?wt.%inH2O 9-10% 90%, technicaL grade 90%GC 91%（≤10% DCM） 92%(顺式和反式混合物) 92%,technicaLgrade 92% 92.00% 92.5-100.0% 93.00% 94.00% 95% min 95%,含0.2% sodium carbonate 稳定剂 95%,含稳定剂铜屑 95%GC 95%（5-10%的支链异构体） 96% ,含80- 120 ppm hydroquinone 稳定剂 96%,contains3,5-di-tert-butyLcatechoLasinhibitor 96%（30%稳定剂） 97%, 异构体混合物 97%,300目 97%,FG 97%,含100-200ppm BHT稳定剂 97%,含60-100ppm BHT稳定剂 97%CP 97%含0.05% BHT 稳定剂 97%（异构体混合物） 97.500% 98%(2,2,4- 和 2,4,4- 混合物) 98%(HPLC) 98%(含稳定剂0.1%KOH) 98%,FG 98%,mixtureofisomers 98%,particLe 98%,含0.01% KOH稳定剂 98%,含0.3 % MgO稳定剂 98%（ACS 级） 98%（同分异构体混合物） 98%，无色液体 98.0%(GC&T) 98.5%(生物技术试剂) 98.5%（分子筛、 Water≤50 ppm） 98atom%15N 98atom%D 99% (GC) 99% BSTFA + 1% TMCS,,用于GC衍生化 99% BSTFA + 10% TMCS,,用于GC衍生化 99% BSTFA + 5% TMCS,,用于GC衍生化 99% 生物技术级 99%(150-400 ppm BHT ) 99%(GC)（标准试剂） 99%(升华纯化试剂） 99%(顺式和反式混合物) 99%, 含0.01%的乙酸铵阻聚剂 99%,200目 99%,300目 99%,500目 99%,50目 99%,contains15?ppmp-tert-butyLcatechoLasinhibitor 99%,containscopperasstabiLizer 99%,containsmonomethyLetherhydroquinoneasinhibitor 99%,containsp-tert-butyLcatechoLasinhibitor 99%,containstriethanoLamineasstabiLizer,containsMEHQasstabiLizer 99%,contains≤100?ppmmonomethyLetherhydroquinoneasinhibitor 99%,stabiLized 99%,含0.1 % KOH 稳定剂 99%,含10 - 20 ppm MEHQ 稳定剂 99%,含10-50ppm 4-methoxyphenoL 稳定剂 99%,含15 ppm 4-叔丁基邻苯二酚稳定剂 99%,含阻聚剂MEHQ 99%,无色 99%,用于HPLC标记 99%,蛋白测序级 99%含稳定剂铜屑 99%（GC对照品试剂） 99%（低苯级） 99%（分子筛、 Water≤50 ppm） 99%（异构体混合物） 99%（熔点标准试剂） 99%（超纯试剂） 99.0% 生物技术级 99.01-101.0% 99.5%(GC),含30ppmMEHQ稳定剂 99.5%(分析标准试剂) 99.5%(标准试剂） 99.5%, hafnium chLoride<50ppm 99.5%, 含0.01%的乙酸铵阻聚剂 99.5%,含0.1 % KOH 稳定剂 99.5%,用于电泳 99.5%GC 99.5%（GC 分析对照品试剂） 99.5%（滴定法测定异氰酸酯） 99.5%（药用试剂） 99.5%（蒸馏试剂） 99.5%（高纯试剂） 99.56%,无水级 99.5（分析标准试剂） 99.6+% 99.7%(GC)（标准试剂） 99.7%(GC标准试剂) 99.7%(分析标准试剂) 99.7%（GC分析标准试剂） 99.8%(标准试剂） 99.8%tracemetaLsbasis 99.8%（ACS光谱级） 99.8%（GC NMR定量标准试剂) 99.8%（分子筛、 Water≤50 ppm） 99.8%（分析标准试剂） 99.8%（高纯试剂) 99.8%（高纯试剂） 99.800% 99.9% (高纯试剂） 99.9% trace metaLs basis 99.9% （高纯试剂,200目） 99.9% （高纯试剂） 99.9%(GC),含40ppm二异丙胺 稳定剂 99.9%(高纯试剂,30nm) 99.9%(高纯试剂） 99.9%,1250目 99.9%,1~5mm 99.9%,200目 99.9%,300目 99.9%,500目 99.9%,800目 99.9%（1-3mm 高纯试剂） 99.9%（500目，高纯试剂） 99.9%（ACS光谱级） 99.9%（LC-MS） 99.9%（农残级试剂） 99.9%（分子筛、水≤30 ppm） 99.9%（对照品试剂） 99.9%（超纯试剂） 99.9%（高纯试剂) 99.9%（高纯试剂）,1μm 99.93% 99.95% trace metaLs basis 99.95%（高纯试剂) 99.9500% 99.97% min 99.97%tracemetaLsbasis 99.98%（高纯试剂）0.8-12mm (0.03-0.47in) 99.98%（高纯试剂） 99.99%(高纯试剂） 99.99%(高纯试剂，10μm） 99.99%,1~5mm 99.99%,4N 99.99%-Zr (REO) 99.99%（200目 高纯试剂） 99.99%（200目，高纯试剂） 99.99%（40-200目，高纯试剂） 99.99%（粉末，1-3mm） 99.99+% 99.996% trace metaLs basis 99.997% metaLs basis 99.997% trace metaLs basis 99.998%（100目,高纯试剂） 99.998%（高纯试剂） 99.999% metaLs basis 99.999% （高纯试剂） 99.999%(tracemetaLbasis) 99.999%(高纯试剂) 99.999%,5N 99.999%（高纯试剂) 99.999%（高纯试剂）,颗粒,1-6 mm 99.999+% 99.9995%tracemetaLsbasis 99.9995%（超纯试剂） 99.9999% metaLs basis，单晶棒状 99.9999%tracemetaLsbasis >95% >95.0%(GC) >98% >99%,acid2O<100ppm >99.0% (GC)(含100ppm BHT稳定剂) >99.0% (GC), 无色液体 >99.0% (GC) >99.0% 电泳级 >99.0%(GC),含10 - 20 ppm MEHQ 稳定剂 >99.5% (GC) >99.7%(GC) >99.998% >= 99 % ?100?mesh,99% ?325?mesh,98% ?325?mesh,99% ACS 99% ACS reagent,≥99.5% ACS, 99% ACS, ≥98.0% (RT) ACS, ≥99% ACS, ≥99.0% (GC) ACS, ≥99.4% ACS, ≥99.5% ACS, 干燥剂 ACS,48% ACS,97%,片状 ACS,98% ACS,≥97.0% ACS,≥98.0%,粉末 ACS,≥99.0%(GC) ACS,≥99.5%(GC) ACS,≥99.5% ACS,≥99.7% ACSreagent,0.5?MCH3ONainmethanoL(0.5N) ACSreagent,37?wt.%inH2O,contains10-15%MethanoLasstabiLizer(topreventpoLymerization) ACSreagent,99% ACSreagent,>98% ACSreagent,NMRgrade,≥99.9% ACSreagent,forthedeterminationofFeinbLoodaccordingtoHeiLmeyer,≥99.5% ACSreagent,granular,+100?meshparticLesize ACSreagent,≥6% ACSreagent,≥85%,peLLets ACSreagent,≥88% ACSreagent,≥96% ACSreagent,≥96.0% ACSreagent,≥97.0%,peLLets ACSreagent,≥97.0% ACSreagent,≥98% ACSreagent,≥98.5% ACS reagent, ≥98.5% ACSreagent,≥99.5%,contains40-150?ppmamyLeneasstabiLizer ACSspectrophotometricgrade,≥99.9% ACS，99.5% ALdraSORB , 99.8% ALdrich^CPR AR, 99% AR, ≥85 wt. % （溶剂：H2O） AR,25-28% AR,30~32% AR,50 wt. % （溶剂：H2O） AR,50%（溶剂：H2O） AR,88% AR,95.0% AR,96% AR,96%（片状） AR,98.0% AR,99%(二甲苯异构体+乙基苯) AR,99%,含10ppm BHT稳定剂 AR,99.0%,含30ppmMEHQ稳定剂 AR,99.0%,含40ppm二异丙胺 稳定剂 AR,99.5% 400目 AR,>40.0% AR,>99%(GC)，包含180-200 ppm MEHQ 稳定剂 AR,>99.0%(GC) AR, AR,≥99.0% AR,含0.025% BHT 稳定剂 AR,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 AR（ SO2≥6%） AR，25%（溶剂:MeOH） AR，25%（溶剂：H2O） AR，96% AnhydroBeads?,?10?mesh,99.9%tracemetaLsbasis AnhydroBeads?,?10?mesh,99.95%tracemetaLsbasis AnhydroBeads?,?10?mesh,99.995%tracemetaLsbasis AnhydroBeads?,?10?mesh,99.999%tracemetaLsbasis AnhydroBeads?,amorphous,?10?mesh,99.99%tracemetaLsbasis AnhydroBeads?,amorphous,?10?mesh,99.999%tracemetaLsbasis ArxadaquaLity,≥99.0%(caLculated,GC,KF) BR BioReagent, for moLecular bioLogy, suitabLe for ceLL culture, suitabLe for insec BioReagent,formoLecularbioLogy,≥98.5% BioReagent,formoLecularbioLogy,≥99%(GC) BioReagent,formoLecularbioLogy,≥99.5% BioReagent,suitabLeforeLectrophoresis,~99% BioReagent,suitabLeforinsectceLLculture,85% BioReagent,suitabLeforinsectceLLculture,~99% BioReagent,suitabLeforinsectceLLculture,≥99% BioReagent,≥99.93% BioULtra, for Luminescence, ≥98.0% (T), peLLets BioULtra, for moLecular bioLogy, 10 M in H2O BioULtra, for moLecular bioLogy, ≥99.0% (GC) BioULtra, for moLecular bioLogy, ≥99.5% (GC) BioULtra, ≥99.0% (F) BioULtra,formoLecularbioLogy,TE-saturated,~73%(T) BioULtra,formoLecularbioLogy,≥99.5%(T) BioULtra,≥85%(T) BioULtra,≥99% BioULtra,≥99.0%(F) BioULtra,≥99.0%(caLc.ondriedsubstances,T) BioULtra,≥99.5%(GC) BioULtra,≥99.5%(RT) BioULtra,≥99.5%(T) BioXtra,suitabLeforproteinsequencing,≥99.5%(GC) BioXtra,≥85%KOHbasis BioXtra,≥98%(acidimetric),peLLets(anhydrous) BioXtra,≥98.0%(T) BioXtra,≥98.0% BioXtra,≥99.0% BioXtra,≥99.5%(GC) BioXtra,≥99.5% BioXtra CP,85.0% CP,88% CP,90% CP,95% CP,96% CP,98.0%,含30ppmMEHQ稳定剂 CP,98.5% CP,99% Co 20.8% min Co 6%, 53% in mineraL spirits CrystaL,99.995% EquiLibratedwith10?mMTrisHCL,pH?8.0,1?mMEDTA,BioReagent,formoLecularbioLogy FCC,FG GC 99% GC,99.5% GC,≥99.9%(GC)（标准试剂） GC对照品,>99.5% GR, 99.5% GR, ≥85 wt. % （溶剂：H2O） GR,25-28% GR,30~32% GR,40.0% GR,70% GR,95% GR,99.7% GR,≥99.5%(GC) GR,≥99.8% GradeI,25%inH2O,speciaLLypurifiedforuseasaneLectronmicroscopyfixative GradeII,25%inH2O HPLC grade, 99.9% HPLCPLus,forHPLC,GC,andresidueanaLysis,99% HPLCPLus,forHPLC,GC,andresidueanaLysis,≥95% HPLCPLus,forHPLC,GC,andresidueanaLysis,≥99.5% HPLCPLus,forHPLC,GC,andresidueanaLysis,≥99.9%,contains50-150?ppmamyLeneasstabiLizer HPLCPLus,≥99.9% HPLC HPLC级,≥99.9% HPLC级,梯度级, ≥99.9% IND LC-MS Liquid,BioReagent,suitabLeforceLLculture,≥98% Lonza quaLity, ≥99.5% (w/w) Low odor Lowbenzene,ACSreagent,≥99.8% Lump, 3 mm max. Lump size, weight 20 g, high purity 99.999% Lump,3?mmmax.Lumpsize,weight100?g,highpurity99.999% Lump,3?mmmax.Lumpsize,weight50?g,highpurity99.999% May exist as crystaLLine dimer NMR grade, ≥99.5% NMR reference standard, 0.05% in benzene-d6 (99.6 atom % D), NMR tube size 3 mm NMR reference standard, 0.23 wt. % in D2O (99.9 atom % D), water 0.05 wt. %, NMR NMR reference standard, 40% in benzene-d6 (99.6 atom % D), NMR tube size 10 mm × NMR reference standard, 85% in D2O (99.9 atom % D), NMR tube size 5 mm × 8 in. NMRreferencestandard,0.05%inbenzene-d6(99.6atom%D),NMRtubesize10?mm×8?in. NMRreferencestandard,0.05%inbenzene-d6(99.6atom%D) NMRreferencestandard,0.1 mMinD2O("100%",99.96atom%D),NMRtubesize5 mm×7 in. NMRreferencestandard,0.1%inchLoroform-d("100%",99.96atom%D) NMRreferencestandard,0.1%inchLoroform-d(99.8atom%D),TMS0.01?%,NMRtubesize3?mm×8?in. NMRreferencestandard,0.1%inchLoroform-d(99.8atom%D),TMS0.01?%,NMRtubesize8?mm×8?in. NMRreferencestandard,0.1%inchLoroform-d(99.8atom%D),TMS0.1?% NMRreferencestandard,0.4%inchLoroform-d(99.8atom%),NMRtubesize3?mm×8?in. NMRreferencestandard,1 mMinD2O("100",99.96atom%D),NMRtubesize5 mm×7 in. NMRreferencestandard,1%inacetone-d6(99.9atom%D),NMRtubesize3?mm×8?in. NMRreferencestandard,1%inchLoroform-d(99.8atom%D) NMRreferencestandard,10 mMinmethanoL-d4(99.8atom%D),NMRtubesize5 mm×8 in. NMRreferencestandard,10%inchLoroform-d(99.8atom%D),NMRtubesize10?mm×8?in. NMRreferencestandard,10%inchLoroform-d(99.8atom%D),NMRtubesize3?mm×8?in. NMRreferencestandard,10%inchLoroform-d(99.8atom%D),TMS0.01?%,NMRtubesize5?mm×8?in. NMRreferencestandard,10%inchLoroform-d(99.8atom%D) NMRreferencestandard,10?mMinD2O("100%",99.96atom%D),NMRtubesize5?mm×7?in. NMRreferencestandard,10?mMinchLoroform-d(99.8atom%D),NMRtubesize5?mm×8?in. NMRreferencestandard,40%inbenzene-d6(99.6atom%D),NMRtubesize3?mm×8?in. NMRreferencestandard,5%inacetone-d6(99.9atom%D),NMRtubesize5?mm×8?in. NMRreferencestandard,5%inchLoroform-d(99.8atom%D),TMS1?%,NMRtubesize5?mm×7?in. NMRreferencestandard,5%inchLoroform-d(99.8atom%D),TMS2?%,NMRtubesize3?mm×8?in. NMRreferencestandard,5%inchLoroform-d(99.8atom%D),TMS2?%,NMRtubesize5?mm×8?in. NMRreferencestandard,5?mMinbenzene-d6(99.6atom%D),NMRtubesize3?mm×8?in. NMRreferencestandard,5?mMinchLoroform-d(99.8atom%D),NMRtubesize3?mm×8?in. NMRreferencestandard,80%inacetone-d6(99.9atom%D),NMRtubesize5?mm×8?in. NMRreferencestandard,85%inD2O(99.9atom%D),NMRtubesize3?mm×8?in. Os ≥42.5% Oxide≈30 wt% PESTANAL?,anaLyticaLstandard,technicaLmixture PESTANAL PT，99.9-100.1% Peroxidasesubstrate,≥98.0%,powder PharmaceuticaL Secondary Standard; Certified Reference MateriaL Precipitated,99.995% Pt 20% ReagentPLus?, ≥99% ReagentPLus?,99%,containscopperasstabiLizer ReagentPLus?,99%,contains≤1%propyLeneoxideasstabiLizer ReagentPLus?,99%,contains≤1000?ppmpropyLeneoxideasstabiLizer ReagentPLus?,99.5% ReagentPLus?,99.8% ReagentPLus?,99.9%tracemetaLsbasis ReagentPLus?,99.9% ReagentPLus?,contains~75?ppmBHTasinhibitor,99% ReagentPLus?,powder,99.8%tracemetaLsbasis >=99% ReagentPLus?,≥99.0%,contains250?ppmBHTasinhibitor ReagentPLus?,≥99.5% ReagentPLus?,≥99.9% Saturatedwith0.1Mcitratebuffer,pH?4.3±0.2,BioReagent,formoLecularbioLogy SigmaGrade,8.36?M,suitabLeforsoLidphaseproteinsequencinganaLysis,≥99%(GC),Liquid Standard for GC,99.5%(GC)(二甲苯异构体+乙基苯） Standard for GC,99.5%(GC) Standard for GC,>99% Standard for GC,>99%（GC) Standard for GC,>99.5% Standard for GC,>99.7%(GC) Standard for GC,>99.9%(GC) Standard for GC,>99.9% Standard for GC,>99.9(GC) Standard for GC,≥99%(GC) Standard for GC,≥99.0%(GC) Standard for GC,≥99.0% Standard for GC,≥99.5% (GC) Standard for GC,≥99.5%(GC),含50ppmMEHQ稳定剂 Standard for GC,≥99.5% Standard for GC,≥99.5%（GC） Standard for GC,≥99.6%(GC) Standard for GC,≥99.8%（标准试剂） SuitabLeforuseingLucosedetermination TEBOL?99,≥99.3% UHPLC,suitabLeformassspectrometry(MS) ULC-MS,0.04% in Water ULC-MS,0.1% in AcetonitriLe ULC-MS,0.3% in Water Usedtodetectthepresenceofwoodfiber. VETRANAL ,anaLyticaLstandard VETRANAL?,anaLyticaLstandard Vetec reagent grade, suitabLe for eLectrophoresis Vetec reagent grade Vetec?,reagentgrade,≥99% absoLute, over moLecular sieve (H2O ≤0.01%), ≥99.0% (GC) absoLute,overmoLecularsieve(H2O≤0.01%),≥99.0%(GC) absoLute,storedovermoLecularsieve amyLenestabiLized,anaLyticaLstandard anaLyticaL standard,>99.8%（GC) anaLyticaL standard anaLyticaLstandard(foracidimetry),ACSreagent anaLyticaLstandard,contains100?ppmhydroquinoneasstabiLizer anaLyticaLstandard,forGPC,Mw1,000 anaLyticaLstandard,forNMRspectroscopy,ACSreagent anaLyticaLstandard,≥90%(GC) anaLyticaLstandard,≥99%(HPLC) anhydrous, beads, 10 mesh, 99.999% trace metaLs basis anhydrous, powder, ≥99.995% trace metaLs basis anhydrous, ≥99% anhydrous, ≥99.97% trace metaLs basis anhydrous,1.0?Mindibromomethane anhydrous,98% anhydrous,99%,containseitherBHTorhydroquinoneasstabiLizer anhydrous,99.3% anhydrous,99.7% anhydrous,99.998% trace metaLs basis anhydrous,ZerO2?,≥99.0% anhydrous,ZerO2?,≥99.6% anhydrous,contains200?ppmMEHQasinhibitor,99% anhydrous,contains40-150?ppmamyLeneasstabiLizer,ZerO2?,≥99.8% anhydrous,contains~75?ppmBHTasinhibitor,99.8% anhydrous,free-fLowing,Redi-Dri?,ACSreagent,≥97% anhydrous,free-fLowing,Redi-Dri?,ACSreagent anhydrous,free-fLowing,Redi-Dri?,ReagentPLus?,99% anhydrous,free-fLowing,Redi-Dri?,reagentgrade,≥98% anhydrous,inhibitor-free,ZerO2?,≥99.9% anhydrous,powder,99.99%tracemetaLsbasis(excLudingW) anhydrous,powder,99.995%tracemetaLsbasis anhydrous,powder,≥99.99%tracemetaLsbasis anhydrous,powder,≥99.995%tracemetaLsbasis anhydrous,subLimed,≥98% anhydrous,≥99.5% beads,0.5-2.0 mmparticLesize,99%tracemetaLsbasis beads,20-40?mesh,reagentgrade,97% biotech.grade,≥99% biotech.grade,≥99.93% ca. 10% in IsopropyL Ether ca. 48% in water ca. 50% certifiedreferencemateriaLfortitrimetry,certifiedbyBAM,≥99.5% contains0.01%potassiumhydroxideasstabiLizer,98% contains0.05 %(w/v)ammoniumformate,0.1 %(v/v)formicacid,5 %(v/v)water,suitabLeforHPLC contains0.05%BHTasinhibitor,97% contains0.1%BHTasstabiLizer,97% contains0.1%KOHasstabiLizer,99% contains0.1%potassiumhydroxideasstabiLizer,99% contains1-3%ethanoLasstabiLizer,96% contains10-15%methanoLasstabiLizer,37?wt.%inH2O contains10-20?ppmMEHQasinhibitor,99% contains10-20?ppmmonomethyLetherhydroquinoneasinhibitor,98% contains100-200?ppmIrganox1076FDasantioxidant,95% contains100?ppmBHTasinhibitor,≥99.0% contains100?ppmhydroquinoneasinhibitor,95% contains15-20?ppmmonomethyLetherhydroquinoneasinhibitor,99% contains200-400BHTasstabiLizer,99% contains250?ppmBHTasinhibitor,ACSreagent,≥99.0% contains250?ppmMEHQasinhibitor,99% contains3-20?ppmhydroquinoneasinhibitor,≥99% contains50-150?ppm4-tert-ButyLcatechoL,99% contains50-185?ppmMEHQasinhibitor,98% contains60-120?ppm2-methyL-2-buteneasstabiLizer,99% contains700-1000?ppmmonomethyLetherhydroquinoneasinhibitor,98% contains75-125?ppmmonomethyLetherhydroquinoneasinhibitor,>90% containsBHTasstabiLizer containscopperasstabiLizer,95% containscopperasstabiLizer,97% containscopperasstabiLizer,99% containscopperasstabiLizer,ReagentPLus?,99% containseitherBHTorhydroquinoneasstabiLizer,ACSreagent,≥99.0% containshypophosphorousasstabiLizer,LoosecrystaLs,ACSreagent,≥99.0% containsnostabiLizer,distiLLed,57?wt.%inH2O,99.99%tracemetaLsbasis containssodium/potassiumcarbonateasstabiLizer,97% contains~0.1%BHTasstabiLizer,anaLyticaLstandard contains≤30?ppmMEHQasinhibitor,99% crystaLLine,≥99.999%tracemetaLsbasis cubicphase,?325?mesh,≥99.5%tracemetaLsbasis dendritic pieces, purified by distiLLation, 99.9% trace metaLs basis dendriticpieces,purifiedbydistiLLation,99.9%tracemetaLsbasis deposition grade, ≥98% (GC), ≥99.99% (as metaLs) desiccant,withmoistureindicator dist., ≥96.0% (AT) dry, 90% dry,98% eLectronicgrade,≥99.99%tracemetaLsbasis eLectronicgrade,≥99.999%metaLsbasis,≥99%(CP) fLake,10mm,weight100?g,purity99.5% fLake,10mm,weight50?g,purity99.5% fLaked,99.5% fLakes,99% foiL,25x25mm,thickness3mm,99.95% foiL,diameter25mm,thickness0.25?mm,purity99% foiL,thickness0.00025?mm,size12.5×12.5?mm,purity99.9% foiL,thickness0.00025?mm,size25×25?mm,purity99.9% foiL,thickness0.005?mm,size12.5×12.5?mm,purity99% foiL,thickness0.015?mm,purity99.8+%,size25×25?mm foiL,thickness0.015?mm,size10×10?mm,purity99.8+% foiL,thickness0.01?mm,size12.5×12.5?mm,purity99.8+% foiL,thickness0.01?mm,size25×25?mm,purity99.8+% foiL,thickness0.025?mm,25.4?mmdiameter,toLerance0.2 foiL,thickness0.025?mm,diameter15mm,toLerance0.2 foiL,thickness0.125?mm,18.8?mmdiameter,purity99.8% foiL,thickness0.125?mm,20?mmdiameter,purity99% foiL,thickness0.125?mm,25?mmdiameter,purity99.8% foiL,thickness0.125?mm,size25×25?mm,purity99% foiL,thickness0.25?mm,29?mmdiameter,purity99.8% foiL,thickness0.25?mm,size25×25?mm,purity99% foiL,thickness0.25?mm,size25×25?mm,purity99.8+% foiL,thickness0.25?mm,size50×50?mm,purity99% foiL,thickness0.5?mm,10?mmdiameter,purity99.8% foiL,thickness0.5?mm,diameter25mm,purity99% foiL,thickness0.5?mm,size100×100?mm,purity99% foiL,thickness0.5?mm,size25×25?mm,purity99% foiL,thickness0.5?mm,size25×25?mm,purity99.8+% foiL,thickness0.5?mm,size50×50?mm,purity99% foiL,thickness1.0?mm,diameter10mm,purity99% foiL,thickness1.0?mm,size25×25?mm,purity99% foiL,thickness1.0?mm,size25×25?mm,purity99.8+% foiL,thickness1.0?mm,size50×50?mm,purity99% foiL,thickness2.0?mm,size10×10?mm,purity99% foiL,thickness2.0?mm,size25×25?mm,purity99% foiL,thickness2.0?mm,size50×50?mm,purity99% for DNA synthesis for HPLC, ≥99.5% for HPLC,≥99.5% for HPLC,≥99.9% for LC-MS,≥99.5% for NMR spectroscopy,≥99.9%(GC) for enzymic, spectrophotometric determination for protein sequence anaLysis, ~5% in heptane for spectrophotometric det. of Au, NO2-, Ce(IV), for the detection of Au, Co, Cu, SCN-, V, ≥97% for spectrophotometric det. of Au,TL(III),W, ≥99% for spectrophotometric det. of SO42-, S2-, ≥97% forGCderivatization,LiChropur?,≥99.0%(GC) forGCderivatization,LiChropur?,≥99.0% forHPLCderivatization,LiChropur ,≥98.5%(HPLCandGC) forHPLCderivatization,LiChropur?,≥99.0%(HPLC) forHPLCderivatization,thedetectionofaLcohoLsandamines,≥99.0% forHPLCderivatization forLuminescence,BioULtra,≥99.5%(GC) fordeterminationofsulfonamideandnitrite,ACSreagent,≥98% forisoLationofRNA formoLecularbioLogy,36.5-38%inH2O formoLecularbioLogy,BioReagent,≥36.0%inH2O(T) formoLecularbioLogy,suitabLeforeLectrophoresis,≥98% formoLecularbioLogy forproteinsequenceanaLysis,≥99.5%(GC) forspectrophotometricdet.ofMo,Sn,W,andaLsoAgandRe,≥97.0% forsynthesis gLaciaL,ReagentPLus?,≥99% gLaciaL,≥99.99%tracemetaLsbasis granular, 99% trace metaLs basis hydrogen-storage grade ingot,99.6%tracemetaLsbasis inhibitor-free,ReagentPLus?,99% inhibitor-free,suitabLeforHPLC,≥99.9% inparaffin meetsanaLyticaLspecificationofFCC,97-100.5% meetsanaLyticaLspecificationofPh.?Eur.,BP,98.5-100.5%(caLc.tothedriedsubstance) naturaL (US), ≥98%, FG naturaL(US),≥97%,FG naturaL, 98% naturaL, ≥98%, FCC naturaL, ≥98%, FG naturaL,50?wt.%ethanoL,FG naturaL,96%,FG naturaL,97%,FG naturaL,FCC,FG naturaL,FG,≥97% naturaL,≥97%,FG naturaL,≥99%,FG naturaL,≥99.5%,FCC,FG oLeic acid functionaLized, fLuorescence λem 450 nm, soLid p.a.,withindicator,peLLets packaged for use in deposition systems packed in FEP bottLes, ~5.5 M in decane (over moLecular sieve 4 ) packedinFEPbottLes,~5.5?Minnonane(overmoLecularsieve4?) peLLets, reagent grade, 95% peLLets,<5?mm,≥99.99%tracemetaLsbasis peLLets,<5?mmparticLesize,≥99.999%tracemetaLsbasis peLLets,semiconductorgrade,99.99%tracemetaLsbasis pharmaceuticaLimpuritystandard phyproof?ReferenceSubstance pieces, thickness <10 mm , typicaLLy, technicaL grade, ~80% pieces,1 cm,99%tracemetaLsbasis powder (moistened with oiL), 55-65% (gas-voLumetric) powder, 30 mesh,95% powder, 95% powder, max. particLe size 250 micron, weight 200 g, purity 99.95% powder,-200?mesh,99.9% powder,-300?mesh powder,10?μm,99.99%tracemetaLsbasis powder,250max.part.size(micron),weight50?g,purity99.95% powder,95% powder,98% powder,99.5%tracemetaLsbasis powder,99.8%tracemetaLsbasis powder,99.99%tracemetaLsbasis powder,99.995%tracemetaLsbasis powder,<100?μm,≥99.98%tracemetaLsbasis powder,<250?μm,depositiongrade,≥99.98%tracemetaLsbasis powder,?100?mesh,99.99%tracemetaLsbasis powder,?100?mesh,≥99.5%tracemetaLsbasis powder,ACSreagent,≥98.0% powder,reagentgrade,≥98% powder,≥99.997%tracemetaLsbasis powderandchunks,≥98% precipitated,99.95%tracemetaLsbasis priLLed,95% primariLydimer,≥95%,FG produced by Wacker Chemie AG, Burghausen, Germany, ≥99.0% (GC) produced by Wacker Chemie AG, Burghausen, Germany producedbyWackerChemieAG,Burghausen,Germany,≥99.5%(GC) purified by redistiLLation, 99.5% purified by redistiLLation, ≥99% purified by redistiLLation, ≥99.5% purified by redistiLLation,≥99.5% purified by subLimation, ≥99% purifiedbyredistiLLation,≥46.5%BF3basis purifiedbyredistiLLation,≥99% purifiedbysubLimation,99% purifiedbysubLimation,≥99.5% purifiedbysubLimation,≥99.9% purified puriss., ≥99.0% (GC) puriss.,meetsanaLyticaLspecificationofPh.Eur.,BP,NF,99.5-100.5%,powder puriss.,meetsanaLyticaLspecificationofPh.Eur.,BP,USP,98-100.5% puriss.,meetsanaLyticaLspecificationofPh.Eur.,BP,USP,99.5-100.5%(GC) puriss.,meetsanaLyticaLspecificationofUSP,99.0-103.0%,powder puriss.,≥98.5%(HPLC) puriss.,≥99% puriss.,≥99.0%(GC) puriss.p.a.,80%(RT) puriss.p.a.,99-104% puriss.p.a.,ACSreagent,K≤0.02%,≥98.0%(T),peLLets puriss.p.a.,ACSreagent,reag.ISO,≥99.9%(GC) puriss.p.a.,ACSreagent,reag.Ph.Eur.,99.0-100.5% puriss.p.a.,ACSreagent,reag.Ph.Eur.,≥99.5%(GC) puriss.p.a.,ACSreagent,reag.Ph.Eur.,≥99.8% puriss.p.a.,ACSreagent,≥98.0%(T) puriss.p.a.,ACSreagent,≥98.5%(GC) puriss.p.a.,ACSreagent,≥99.0%(RT) puriss.p.a.,ACSreagent,≥99.5%(GC) puriss.p.a.,ACSreagent,≥99.8%(driedmateriaL,RT) puriss.p.a.,crystaLLized,≥99.0%(T) puriss.p.a.,dryingagent,ACSreagent,≥98.0%(caLc.basedondrysubstance,KT) puriss.p.a.,reag.Ph.Eur.,98.5-101.0%(caLc.tothedriedsubstance) puriss.p.a.,reag.Ph.Eur.,≥99.5%(GC) puriss.p.a.,suitabLeforHPLC,≥99.0%(GC) puriss.p.a.,≥99.0%(KT),yeLLow puriss.p.a.,≥99.0%(T) puriss.p.a.pLus,≥25%NH3inH2O puriss.， >= 99.0 % GC purum, ≥99.0% (AT) purum,33%inabsoLuteethanoL(~5.6M) purum,suitabLeforeLectronmicroscopy,≥98.0%(GC) purum,~80%intoLuene purum,≥95.0%(GC) purum,≥96.0%(NT) purum,≥97.0%(NT) purum,≥97.5%(GC) purum,≥99.0%(AT) purump.a.,98.0-103%(RT) purump.a.,99.0-103%(RT) purump.a.,ACSreagent,≥98.0%(RT) purump.a.,≥97.0%(KT) purump.a.,≥98.0% purump.a.,≥99.0%(AT) purump.a.,≥99.0%(asH2INa3O6,RT) random pieces, 99% reagent grade, 97% reagent grade reagentgrade,115%H3PO4basis reagentgrade,90%,fLakes reagentgrade,97%,contains≤1000?ppmpropyLeneoxideasstabiLizer reagentgrade,97%,fLakes reagentgrade,97%,powder reagentgrade,avaiLabLechLorine4.00-4.99?% reagentgrade,crystaLLine reagentgrade,powder,98% reagentgrade,≥90% reagentgrade,≥95% reagentgrade,≥98%,peLLets(anhydrous) reagentgrade,≥98.0% reagentgrade,≥99% redist.,≥99.0%(GC) redistiLLed,≥99%,FCC,FG redistiLLed,≥99.5% regiorandom rod,100mm,diameter7.0mm,99% rod,diam.~2 cm,≥99%tracemetaLsbasis semiconductor grade MOS PURANAL (HoneyweLL 17928), 49.5-50.5% semiconductor grade PURANAL (HoneyweLL 17713) semiconductor grade VLSI PURANAL (HoneyweLL 17604) semiconductorgrade,peLLets,99.99%tracemetaLsbasis(PurityexcLudessodiumcontent.) spectrophotometricgrade,≥99% spectrophotometricgrade,≥99.0% standard for GC, ≥99.5% (GC) standard for GC,>99.5%(GC) standard for GC,≥98%(GC) standard for GC,≥99.0%(GC) standard for GC,≥99.5%(GC), 含0.01%的乙酸铵阻聚剂 standard for GC,≥99.5%(GC),含0.01% BHT稳定剂 standard for GC,≥99.5%(GC) standard for GC,≥99.7%(GC) subLimedgrade,≥99% subLimedgrade,≥99.9%tracemetaLsbasis suitabLe for neutraL marker for measuring eLectroosmotic fLow (EOF), ~99% suitabLeforDNAsynthesis,≥99.9%(GC) suitabLeforHPLC,98% suitabLeforHPLC,99% suitabLeforHPLC,99.7% suitabLeforHPLC,LiChropur?,≥99.5%(T) suitabLeforHPLC,gradientgrade,≥99.9% suitabLeforHPLC,gradientgrade,≥99.90%(GC) suitabLeforHPLC,≥75%cycLopentanebasis suitabLeforHPLC,≥96% suitabLeforHPLC,≥99.0% suitabLeforHPLC,≥99.7% suitabLeforeLectrophoresis,suitabLeforfixingsoLution(forIEFandPAGEgeLs),≥99% suitabLeforeLectrophoresis,≥99%(HPLC),powder suitabLeforeLectrophoresis,≥99.5% suitabLeformicrobioLogy suitabLeforpLantceLLculture,BioReagent,≥99%,powder suitabLeforpLantceLLculture,BioReagent suitabLeforscintiLLation,≥99% suitabLeforscintiLLation,≥99.0%(GC) tabLet,10mgsubstratepertabLet tabLet,15mgsubstratepertabLet tabLet,1mgsubstratepertabLet tabLet,2mgsubstratepertabLet tabLet,30mgsubstratepertabLet tabLet,3mgsubstratepertabLet tabLet,4mgsubstratepertabLet tabLet,60mgsubstratepertabLet technicaL grade, mixture of ring and chain isomers technicaL grade technicaL, 32-36% indium basis technicaL, ≥97.0% (N) technicaL,≥98.0%(HPLC) technicaL,(cis+trans),mixtureofcis-andtrans-isomers(~1:6),~70%(GC) technicaL,~40%inH2O(~1.5M) technicaL,≥90%(GC),strongLybrown technicaL,≥95%(T) technicaL,≥98.0%(GC) technicaLgrade,60% technicaLgrade,70% technicaLgrade,93% technicaLgrade,~95% technicaL testedaccordingtoPh.Eur. ultrapuregrade,≥99.5% unstabiLized,ReagentPLus?,≥99% unstabiLized,purifiedbyredistiLLation,≥99% viscosity0.65?cSt?(25?°C) voLumetric,8.0?MKOH(8.0N) wire,1.2?mmdiameter,Length0.05m,purity99.7% wire,1.2?mmdiameter,Length0.1m,purity99.7% wire,1.2?mmdiameter,Length0.2m,purity99.7% wirereeL,0.05m,diameter0.25mm,anneaLedandcLean,99.7% wirereeL,0.05m,diameter0.356mm,anneaLedandcLean,99.7% wirereeL,0.05m,diameter0.5mm,anneaLedandcLean,99% wirereeL,0.05m,diameter0.6mm,anneaLedandcLean,99% wirereeL,0.05m,diameter0.85mm,anneaLedandcLean,99% wirereeL,0.1m,diameter0.125mm,anneaLedandcLean,99.7% wirereeL,0.1m,diameter0.25mm,anneaLedandcLean,99.7% wirereeL,0.1m,diameter0.356mm,anneaLedandcLean,99.7% wirereeL,0.1m,diameter0.75mm,anneaLedandcLean,99% wirereeL,0.1m,diameter0.85mm,anneaLedandcLean,99% wirereeL,0.2m,diameter0.25mm,anneaLedandcLean,99.7% wirereeL,0.2m,diameter0.5mm,anneaLedandcLean,99% wirereeL,0.2m,diameter0.6mm,anneaLedandcLean,99% wirereeL,0.2m,diameter0.75mm,anneaLedandcLean,99% wirereeL,0.2m,diameter0.85mm,anneaLedandcLean,99% wirereeL,0.3m,diameter0.356mm,anneaLedandcLean,99.7% wirereeL,0.5m,diameter0.05mm,anneaLedandcLean,99.7% wirereeL,0.5m,diameter0.125mm,anneaLedandcLean,99.7% wirereeL,0.5m,diameter0.25mm,anneaLedandcLean,99.7% wirereeL,0.5m,diameter0.5mm,hard,99.99+% wirereeL,1m,diameter0.125mm,anneaLedandcLean,99.7% wirereeL,1m,diameter0.25mm,anneaLedandcLean,99.7% wirereeL,5m,diameter0.05mm,anneaLedandcLean,99.7% zone-refined,purifiedbysubLimation,≥99.95% ~1.0?M(CH3CH2)4NOHinH2O,eLectrochemicaLgrade ~105%H3PO4basis ~25% NH3 basis puriss.p.a.,reag.ISO,reag.Ph.Eur.,~25%NH3basis ~25%inmethanoL(~1.5M) ~3.4 M in 2-methyLtetrahydrofuran ~32 wt. % in phthaLate-free pLasticizer mixture ~36%rhodium(Rh)basis ~40%inH2O ~45 wt. % in H2O (T) ~5%(dimethyLdichLorosiLaneinheptane),SeLectophore? ~50 wt. % in tricresyL phosphate ~55?wt.%inH2O ~80%inH2O,forspectrophotometricdet.ofpaLLadium,iron,uranium(VI),moLybdatesandnitrites ~80?wt.%inodorLessmineraLspirits ≈67% ≤77% ≥25% NH3 in H2O, semiconductor grade PURANAL (HoneyweLL 17814) ≥25% NH3 in H2O, semiconductor grade SLSI PURANAL (HoneyweLL 17301) ≥25% NH3 in H2O, semiconductor grade VLSI PURANAL (HoneyweLL 17605) ≥82%(RT) ≥85 wt. % in H2O, ≥99.99% metaLs basis ≥85%KOHbasis,peLLets,white ≥85%（P2O5 计量） ≥85?wt.%inH2O,≥99.999%tracemetaLsbasis ≥89.0% ≥92% ≥93% ≥95 % ≥96%, FG ≥96%,FG ≥96.0%(caLc.ondrysubstance,T) ≥96.0% ≥97%,stabiLizedwithBHT,FG ≥97.0% (GC) ≥97.0%(T) ≥97.0%(gas-voLumetric),tabLet(~0.5geach) ≥97.0%(gas-voLumetric) ≥98%(GC) ≥98%(GC)（标准试剂） ≥98%(titration),crystaLLine ≥98%, deposition grade ≥98%,containscopperasstabiLizer ≥98%,depositiongrade ≥98%,peLLets(anhydrous) ≥98%,stabiLized,FG ≥98.0% (acetaLdehyde & ethanoL, GC) ≥98.0%(HPLC) ≥98.0%(TLC) ≥98.5% (GC) ≥98.5% ≥99% (GC) ≥99%, FG ≥99%,acid2O<10ppm ≥99%,contains10-20?ppmmonomethyLetherhydroquinoneasinhibitor ≥99%,contains10-60?ppmmonomethyLetherhydroquinoneasinhibitor ≥99%,contains35-45?ppmmonomethyLetherhydroquinoneasinhibitor ≥99%,fLakes ≥99%,purifiedbyredistiLLation ≥99.0% (HPLC) ≥99.0%(AT) ≥99.0%(GC)（标准试剂） ≥99.0%(GC/NT) ≥99.0%(HPLC) ≥99.0%(titration) ≥99.0%, contains ~0.005% 4-tert-butyLcatechoL as inhibitor ≥99.0%, naturaL, FG ≥99.0%,dry ≥99.5% (GC) ≥99.5% ≥99.5% trace metaLs basis ≥99.5%(GC)（分析标准试剂） ≥99.5%(GC)（标准试剂）,含0.01% MEHQ 稳定剂 ≥99.5%, stabiLized, FG ≥99.5(GC),含0.01% KOH稳定剂 ≥99.7%(GC) ≥99.7%,FCC,FG ≥99.8% (GC) ≥99.8%(GC) ≥99.9%(GC) ≥99.9%, FCC ≥99.9%,acid2O<10ppm ≥99.9% ≥99.95% trace metaLs basis ≥99.95%tracemetaLsbasis ≥99.98% ≥99.999% metaLs basis，粒径：1-6mm ≥99.999%(metaLsbasis) ≥99.999%（高纯试剂）粒径：1-6mm 低苯<0.02%，适用于苯系物分析检测 光谱级,99.99% 光谱级,≥99.5% 农残级,≥99.9%(GC) 分析对照品, 99% 分析对照品, >99.5%(GC) 分析对照品,96% 分析对照品,98% 分析对照品,99%(GC) 分析对照品,>99.5%(GC) 分析对照品,>99.5%(GC） 分析对照品,≥99.5% 分析对照品,≥99.8%(GC) 分析对照品,≥99.8% 分析对照品 分析标准品, ≥99.5% (GC) 分析标准品,99% 分析标准品,>99.5%(GC) 分析标准品,>99.5%（GC) 分析标准品,>99.9%(GC) 分析标准品,>99.9%（GC） 分析标准品,≥99.0%(GC) 分析标准品,≥99.6% 分析标准品,≥99.7%(GC) 分析标准品,≥99.7% 分析标准品,≥99.9%(GC) 分析标准品，≥99.7% (GC) 制备色谱级, 99.9% 包含50-185 ppm MEHQ稳定剂, 98% 指示液,0.0015g/ml, pH:2.4(COLORLESS)--4.4(YELLOW) 无水, ≥99%, 4-16mesh 无水,AR 无水 无水级, 99.99%（高纯试剂） 无水级, 水分≤0.3%,含变性剂 昆虫细胞培养级, ≥99% 梯度色谱级, ≥99.9% 活性氯10% 消毒专用 消毒用，喷雾瓶装 熔点标准试剂 环保级，99.5% 生物技术级 用于GC衍生化, ≥99.0% (GC) 用于分子生物学,≥99.5%(GC) 用于分子生物学,≥99.5% 用于检测类固醇,≥99.0%(HPLC) 用于氨基酸分析,≥99.5%(GC) 用于电泳 用于离子对色谱,≥99.5% (GC) 电子级, 99.99% metaLs basis，钠除外 电子级,99.9%（高纯试剂） 电子级，≥99.8%，总金属杂质≤20ppm 电泳, 99%生物技术级 电泳专用级, ≥99% 电泳专用级 电镜专用，2.5%（溶剂：H2O）pH：7.2-7.4 电镜专用，4% 红外测油仪专用,≥99.0% 红外测油仪专用，≥99.8% 约13%于四氢呋喃中, 约2moL/L 约15%于己烷中 约2.0moL/L 色谱级, ≥99.9% 色谱级,99.0% 色谱纯,PH6.85 0.05moL/L 试剂级 超干,99.9% (高纯试剂） 重蒸馏, ≥99.5% 颗粒 基础级试剂，适用于制备 颗粒状,AR,95% 颗粒状,GR,95% （50%）, 生物技术级

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